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Semiconductor High-Purity Media Measurement

Ultrapure water and specialty gas measurement configured around the principle of introducing no contamination.

Semiconductor manufacturing requires ppb-level media purity, making instrument selection fundamentally different from conventional industry.

Ultrapure water

At 18.2 MΩ·cm, ultrapure water cannot be measured by electromagnetic meters — use ultrasonic or Coriolis. All wetted parts are high-purity PFA or PTFE with flared or welded connections, avoiding seals that could leach contaminants.

Specialty gases

Silane, ammonia and tungsten hexafluoride are pyrophoric, toxic and corrosive. Instruments must be intrinsically safe or flameproof with internal roughness Ra ≤ 0.25 μm to prevent particle adhesion. Mass flow controllers dominate, calibrated with the actual process gas.

Wet chemicals

Flow measurement of sulfuric acid, hydrofluoric acid and hydrogen peroxide centres on material compatibility. PVDF or PFA-lined electromagnetic meters are common, though with lower temperature limits than conventional linings.

Core principle

"Introduce no contamination" comes ahead of measurement accuracy. Any construction that could release metal ions, shed particles or trap residual liquid should be ruled out.

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